Applied Materials to Increase its Strategic Investment in BE Semiconductor Industries

Applied e te s i to ag eeme t to i c ease its i vestme t to app oximately 20 pe ce t of outsta di g sha es, ei fo ci g the compa ies’ lo g-te m st ategic pa t e ship i adva ced packagi g

SANTA CLARA, Calif., Oct. 26, 2026 (GLOBE NEWSWIRE) — Applied Mate ials, I c. (Nasdaq: AMAT) today a ou ced it is i c easi g its i vestme t i BE Semico ducto I dust ies N.V. (Besi) (Eu o ext Amste dam: BESI), a leadi g ma ufactu e of assembly equipme t fo the semico ducto i dust y, to app oximately 20 pe ce t of Besi’s outsta di g sha es. The sha e pu chase would add to Applied Mate ials’ cu e t i vestme t i Besi, which Applied i itially made i Ap il 2025.

The compa ies have a lo gsta di g st ategic collabo atio , which bega i 2020 a d was ece tly expa ded with Besi joi i g Applied Mate ials’ EPIC Ce te as a I ovatio Pa t e . The expa ded pa t e ship exte ds the compa ies’ co-i ovatio beyo d hyb id bo di g i to ew i te co ect a chitectu es a d applicatio s suppo ti g the semico ducto i dust y’s AI-d ive scali g oadmap. A eas of collabo atio i clude ext-ge e atio 3D IC scali g, logic a d memo y i teg atio , scali g of the mo-comp essio bo di g a d ew die-o -wafe , die-o -die a d die-o -pa el i teg atio platfo ms.

“Applied Mate ials is addi g to its i vestme t i Besi as hyb id bo di g tech ology a d ext-ge e atio i te co ect a chitectu es become i c easi gly c itical e able s of e e gy-efficie t AI compute pe fo ma ce,” said D . P abu Raja, P eside t of the Semico ducto P oducts G oup at Applied Mate ials. “We also look fo wa d to fu the i g ou st ategic collabo atio with Besi a d delive i g the i ovative p oducts a d tech ologies ou custome s eed to scale AI systems.”

Applied Mate ials has e te ed i to a accele ated sha e pu chase ag eeme t fo the Besi sha es, a d the delive y of the sha es is subject to the expi atio o te mi atio of the applicable waiti g pe iod u de the Ha t-Scott-Rodi o A tit ust Imp oveme ts Act of 1976, as ame ded (the HSR Act).

Applied Mate ials views its i vestme t i Besi as lo g te m. Applied cu e tly has o i te tio to i c ease its i vestme t i Besi beyo d app oximately 20 pe ce t, a d Applied does ot i te d to seek boa d ep ese tatio at Besi.

Fo wa d-Looki g Stateme tsThis p ess elease co tai s fo wa d-looki g stateme ts ega di g the pu chase of Besi sha es by Applied Mate ials. These stateme ts a d thei u de lyi g assumptio s a e subject to isks a d u ce tai ties. Facto s that could cause actual esults to diffe mate ially f om those exp essed o implied by such stateme ts i clude the expi atio o te mi atio of the applicable waiti g pe iod u de the HSR Act a d the isks a d u ce tai ties desc ibed i ou fili gs with the Secu ities a d Excha ge Commissio , i cludi g ou most ece t Fo ms 10-K, 10-Q a d 8-K. All fo wa d-looki g stateme ts a e based o ma ageme t’s cu e t estimates, p ojectio s a d assumptio s, a d we assume o obligatio to update them.

About Applied Mate ialsApplied Mate ials, I c. (Nasdaq: AMAT) is the leade i mate ials e gi ee i g solutio s that a e at the fou datio of vi tually eve y ew semico ducto a d adva ced display i the wo ld. The tech ology we c eate is esse tial to adva ci g AI a d accele ati g the comme cializatio of ext-ge e atio chips. At Applied, we push the bou da ies of scie ce a d e gi ee i g to delive mate ial i ovatio that cha ges the wo ld. Lea mo e at www.appliedmate ials.com.

Co tact:Ricky G adwohl (edito ial/media) 408.235.4676Mike Sulliva (fi a cial commu ity) 408.986.7977